表面和薄膜过程导论

出版时间：2003-11  出版社：世界图书出版公司北京公司  作者：J.A.Venables  页数：372  

内容概要

　　表面和薄膜科学是微电子、光电子和磁工业的物理基础，是现代社会技术进步的科学保证。在微观以至原子水平上研究和操纵表面让我们能够理解许多具有重要技术意义之器件的制作与运行。《表面和薄膜过程导论（第4版）》关注发生在表面和薄膜中的物理过程，详细介绍了与表面和薄膜相关的物理过程，包括热力学与运动学的理论基础，洁净表面的制备和表面的表征与分析技术，表面吸附与脱附过程，金属和半导体表面性质，外延生长和薄膜器件的表面过程等等内容。

书籍目录

PrefaceChapter 1 Introduction to surface processes1.1 Elementary thermodynamic ideas of surfaces1.2 Suface energies and the Wulff throrem1.3 Thermodynamics versus kinetics1.4 Introduction to surface and adsorbate reconstructions1.5 Introduction to surface electronicsFurther reading for chapter1Problems for chapter 1Chapter 2 Surfaces in vacuum ultra-high vacuum techniques and processes2.1 Kinetic thery concepts2.2 Vacum concepts2.3 UHV hardware:pumps,tubes,materials and pressure measureent2.4 Surface rpeparation and cleaning procedures in situ experiments2.5 Thin film deposition procedures:sources of informationFurther reading for chapter2Problems for chapter2Chapter 3 Electron-based techniques for examinnig surface and thin film processes3.1 Classification of suface and microsopy techniques3.2 Diffraction and quasi-elastie scattering techniques3.3 Inlastic scattering techniques;chemical and electronic state information3.4 Quantification of Auger spectra3.5 Microsopy-spectroscopy SEM SAM SPM etc.Further reading for chapter3Problems talks and projects for chapter 3Chapter 4 Surface processes in adsorptionChapter 5 Surface processes in epitaxial growthChapter 6 Electronic structure and processes at metalic surfacesChapter 7 Semiconductor surfaces and interfacesChapter 8 Surface procces in thin film devicesChapter 9 Postscript-where do we go from here?RerferencesIndex